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The Shi Group Research Description

The Shi group's research focuses on understanding the chemical vapor deposition process at a molecular level using laser analytical and spectroscopic techniques, application of chemical vapor deposition method for semiconductor nanostructures, and application of laser dewetting method for metal nanoparticle formation.

Hot-wire Chemical Vapor Deposition Chemistry in the Gas Phase and on Wire Surfaces for SiCx, SiNy and SiCxNy Films

- to understand the nature of gas-phase film growth species and characterize their reactivity

 

- to find environmentally benign or the best-performing precursors

 

- to study the metal alloy formation on hot wires, aiming at finding a solution to the filament aging problem

Chemical Vapor Deposition Growth of Semiconductor Nanostructures

- to synthesize semiconductor nanostructures using gaseous precursors on a variety of substrates

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- to optimize the synthesis process and generate tunable, reproducible procedures

 

- to understand how different materials and substrates influence the synthesis procedure and material applications

Pulsed Laser-induced Dewetting of Thin Metallic Films for the Formation of Metal Nanoparticles

- to prepare metal nanoparticles using pulsed laser induced dewetting

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- to explore the dewetting of metal bilayers to form bimetallic nanoparticles

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- to understand how key parameters including thin film material and thickness, substrate, irradiation time, and laser fluence impact nanoparticle formation

The Shi Group Equipment

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Nd:YAG lasers

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Dye lasers

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Time of flight (TOF) chamber 

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Nd:YAG lasers

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Chemical vapor deposition (CVD) reactor

Additional Equipment

  • Electrochemical anodization system

  • SP-50 Potentiostat

  • Spin Coater

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