The Shi Group Research Description
The Shi group's research focuses on understanding the chemical vapor deposition process at a molecular level using laser analytical and spectroscopic techniques, application of chemical vapor deposition method for semiconductor nanostructures, and application of laser dewetting method for metal nanoparticle formation.
Hot-wire Chemical Vapor Deposition Chemistry in the Gas Phase and on Wire Surfaces for SiCx, SiNy and SiCxNy Films
- to understand the nature of gas-phase film growth species and characterize their reactivity
- to find environmentally benign or the best-performing precursors
- to study the metal alloy formation on hot wires, aiming at finding a solution to the filament aging problem
Chemical Vapor Deposition Growth of Semiconductor Nanostructures
- to synthesize semiconductor nanostructures using gaseous precursors on a variety of substrates
​
- to optimize the synthesis process and generate tunable, reproducible procedures
- to understand how different materials and substrates influence the synthesis procedure and material applications
Pulsed Laser-induced Dewetting of Thin Metallic Films for the Formation of Metal Nanoparticles
- to prepare metal nanoparticles using pulsed laser induced dewetting
​
- to explore the dewetting of metal bilayers to form bimetallic nanoparticles
​
- to understand how key parameters including thin film material and thickness, substrate, irradiation time, and laser fluence impact nanoparticle formation
The Shi Group Equipment
Nd:YAG lasers
Dye lasers
Time of flight (TOF) chamber
Nd:YAG lasers
Chemical vapor deposition (CVD) reactor
Additional Equipment
-
Electrochemical anodization system
-
SP-50 Potentiostat
-
Spin Coater